| 摘要 |
The present application relates to novel chelate resins which contain, as a functional group, quaternary nitrogen atoms in structures of the general formula (I) in which at least one of the radicals R1 to R3 represents an optionally substituted radical of the series consisting of picolyl, methylquinoline or methylpiperidine, m represents an integer from 1 to 4 and M represents the polymer matrix and X represents a counterion of the series consisting of hydroxide OH−, halide, preferably Cl−, Br−, or sulphate SO42−, a process for their preparation and the use thereof, in particular the use of the novel chelate resins in hydrometallurgy and electroplating. |
