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发明名称
A method for producing an epitaxial silicon single crystal wafer and the epitaxial single crystal wafer
摘要
申请公布号
EP0959154(B1)
申请公布日期
2010.04.21
申请号
EP19990108623
申请日期
1999.05.11
申请人
SHIN-ETSU HANDOTAI CO., LTD.
发明人
TAMATSUKA, MASARO;AIHARA, KEN;YOSHIDA, TOMOSUKE
分类号
C30B15/00;C30B29/06
主分类号
C30B15/00
代理机构
代理人
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地址
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