发明名称 |
SUBSTRATES FOR SPATIALLY SELECTIVE MICRON AND NANOMETER SCALE DEPOSITION AND COMBINATORIAL MODIFICATION AND FABRICATION |
摘要 |
<p>A substrate (1) for spatially selective micron and nanometer scale deposition and/or reaction, which has a support (3), a conductive layer (5) on the support, a dielectric layer (7) to hold an electrostatic charge pattern such as a photoconductive layer of a material which dissipates an electric charge upon receiving incident radiation thereon, and a chemically functional layer (9), such that electrostatic charge patterns may be formed in a predetermined manner upon the substrate to influence the movement of charged droplets in an emulsion (15) on the substrate. The chemically functional layer either provides a surface for chemical functionalization of the substrate or prevents access or reaction to the dielectric or photoconductive layer.</p> |
申请公布号 |
EP1644518(A4) |
申请公布日期 |
2010.04.21 |
申请号 |
EP20040737486 |
申请日期 |
2004.06.30 |
申请人 |
RAUSTECH PTY LTD. |
发明人 |
HASTWELL, PETER, JOHN;KAETHNER, TIMOTHY, MARK |
分类号 |
C12Q1/68;B01J19/00;C12M1/34;G01N33/48 |
主分类号 |
C12Q1/68 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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