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发明名称
CLEAN RATE IMPROVEMENT BY PRESSURE CONTROLLED REMOTE PLASMA SOURCE
摘要
申请公布号
EP2176444(A1)
申请公布日期
2010.04.21
申请号
EP20080781708
申请日期
2008.07.11
申请人
APPLIED MATERIALS, INC.
发明人
FURUTA, GAKU;LI, LIWEI;HASHIMOTO, TAKAO;CHOI, SOO YOUNG
分类号
C23C16/44;B08B7/00
主分类号
C23C16/44
代理机构
代理人
主权项
地址
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