发明名称 A METHOD FOR TREATMENT OF POLYSILAZANE OR POLYSILAZANE SOLUTION, THE POLYSILAZANE OR POLYSILAZANE SOLUTION, AND A FABRICATION PROCESS OF A SEMICONDUCTOR DEVICE
摘要 PURPOSE: A method for handling polysilazane or a polysilazane solution is provided to obtain polysilazane solution with little deterioration of various characteristics by performing various processes. CONSTITUTION: A method for handling polysilazane or a polysilazane solution comprises: synthesizing polysilazane and preparing the polysilazane solution in a first space isolated from outside air, the first space being mainly supplied with air from which amine, basic substance, volatile organic compound and acidic substance are eliminated. The air from which the amine, basic substance, volatile organic substance and acidic substance are eliminated is formed by allowing outside air to pass through an adsorbent which adsorbs the amine, basic substance, volatile organic substance and acidic substance.
申请公布号 KR20100040827(A) 申请公布日期 2010.04.21
申请号 KR20100029680 申请日期 2010.04.01
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 NAKAZAWA KEISUKE;TACHIBANA KATSUHIKO;HOSHI TAKESHI;KIYOTOSHI MASAHIRO;KAWASAKI ATSUKO;ARISUMI OSAMU
分类号 C08J5/22;C08G77/04;C08L83/04;H01L21/31 主分类号 C08J5/22
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