发明名称 IN-SITU ION SOURCE CLEANING FOR PARTIAL PRESSURE ANALYZERS USED IN PROCESS MONITORING
摘要 An ion source apparatus for partial pressure analyzers and in-situ cleaning method thereof based on inducing a hollow cathode discharge (HCD) inside the ion source. The HCD is formed by applying a high negative voltage to one or more parts of the ion source, including the anode electrode, the lens focus plate and at least one other lens or other form of plate, such as a total pressure collector plate.
申请公布号 KR20100040810(A) 申请公布日期 2010.04.21
申请号 KR20097027584 申请日期 2008.07.11
申请人 INFICON, INC. 发明人 YANG CHENGLONG;MERRILL JEFFREY P.;FREES LOUIS C.
分类号 H01L21/302;H01J49/26 主分类号 H01L21/302
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