发明名称 Photosensitive resin composition, image forming material and image forming method using thereof
摘要 A photosensitive resin composition containing an alkali soluble resin, an ethylenically unsaturated compound, a near infrared absorbing dye, a compound containing a halomethyl group and a compound containing an organoboron anion, wherein the alkali soluble resin is an acryl resin having one or more pendant groups in which both terminals of a diol compound have been blocked with isophorone diisocyanates and then (meth)acryloyl has been added. Also provided is an image forming material having a substrate, and a photosensitive layer formed by the photosensitive resin composition on the substrate, as well as an image forming method.
申请公布号 US7700264(B2) 申请公布日期 2010.04.20
申请号 US20060589891 申请日期 2006.10.31
申请人 NIPPON PAINT CO., LTD. 发明人 UMEMOTO HIROTOSHI
分类号 G03F7/029;G03F7/028;G03F7/30 主分类号 G03F7/029
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