发明名称 SOI SUBSTRATE AND METHOD FOR PRODUCING SAME, SOLID-STATE IMAGE PICKUP DEVICE AND METHOD FOR PRODUCING SAME, AND IMAGE PICKUP APPARATUS
摘要 <p>PURPOSE: A silicon on insulator(SOI) substrate, a solid-state image pick-up device, a method for manufacturing the same and an image pick-up device are provided to suppress white spot and a dark current by forming a photoelectric transformation unit in the silicon layer of the SOI substrate. CONSTITUTION: An oxide silicon layer(12) is formed on a silicon substrate(11). A silicon layer(13) is formed on the oxide silicon layer. A gattering layer(14) is formed on the silicon substrate. A damage layer(15) includes an impurity implant region which is formed on the oxide silicon layer. The damage layer has a gettering ability which captures metal impurity in the silicon layer.</p>
申请公布号 KR20100040673(A) 申请公布日期 2010.04.20
申请号 KR20090092317 申请日期 2009.09.29
申请人 SONY CORPORATION 发明人 TAKIZAWA RITSUO
分类号 H01L21/20;H01L21/02;H01L21/265;H01L21/322;H01L27/12;H01L27/146 主分类号 H01L21/20
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