发明名称 |
SOI SUBSTRATE AND METHOD FOR PRODUCING SAME, SOLID-STATE IMAGE PICKUP DEVICE AND METHOD FOR PRODUCING SAME, AND IMAGE PICKUP APPARATUS |
摘要 |
<p>PURPOSE: A silicon on insulator(SOI) substrate, a solid-state image pick-up device, a method for manufacturing the same and an image pick-up device are provided to suppress white spot and a dark current by forming a photoelectric transformation unit in the silicon layer of the SOI substrate. CONSTITUTION: An oxide silicon layer(12) is formed on a silicon substrate(11). A silicon layer(13) is formed on the oxide silicon layer. A gattering layer(14) is formed on the silicon substrate. A damage layer(15) includes an impurity implant region which is formed on the oxide silicon layer. The damage layer has a gettering ability which captures metal impurity in the silicon layer.</p> |
申请公布号 |
KR20100040673(A) |
申请公布日期 |
2010.04.20 |
申请号 |
KR20090092317 |
申请日期 |
2009.09.29 |
申请人 |
SONY CORPORATION |
发明人 |
TAKIZAWA RITSUO |
分类号 |
H01L21/20;H01L21/02;H01L21/265;H01L21/322;H01L27/12;H01L27/146 |
主分类号 |
H01L21/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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