APPARATUS AND METHOD FOR MANUFACTURING POLY-SI THIN FILM

摘要

PURPOSE: An apparatus and a method for manufacturing a poly-silicon thin film are provided to reduce a processing time by applying power on the target position of a conductive thin film. CONSTITUTION: A substrate loading/unloading unit(200) is installed on the lower side of a chamber(100). The substrate loading/unloading unit transfers a substrate which includes an amorphous silicon thin film and a conductive thin film. A power unit(300) is installed on the upper side of the chamber and includes electrodes. The electrodes are transferred to the manufacturing process direction and to the vertical direction of the manufacturing process direction.