| 摘要 |
PURPOSE: A vacuum deposition apparatus is provided to perform a deposition process through evaporation and sputtering of one apparatus, to perform plasma pretreatment using RF power, AC power, and an ion beam. CONSTITUTION: A vacuum deposition apparatus comprises a vacuum container(10), a door(20), a rotating jig(30), an electronic heater(40), a target(50), and a gas supply pipe. A product to be coated is mounted on the rotating jig. The electronic heater is arranged on the central of the rotating jig. The target is installed on both sides of the inner circumference of the vacuum container. The gas supply pipe is installed around the target of the vacuum container.
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