发明名称 APPARATUS FOR PROCESSING SUBSTRATE WITH PLASMA
摘要 PURPOSE: A plasma process apparatus is provided to precisely control the temperature of a shower head by attaching a cooling unit which cools the shower head based on the circulation of a coolant. CONSTITUTION: A chamber(100) provides a space for processing a substrate(S). The upper electrode(110) and the lower electrode(120) are arrange on the upper side and the lower side of the chamber. The upper electrode includes a shower head body, a shower head(112) and a cooling unit(116). The shower head forms a diffusion hole for a fine process gas. The cooling unit contacts to the upper side of the shower head to cool the shower head. A flow path is formed in the coolant to circulate a coolant.
申请公布号 KR20100039835(A) 申请公布日期 2010.04.16
申请号 KR20100020574 申请日期 2010.03.08
申请人 ADP ENGINEERING CO., LTD. 发明人 LEE, YOUNG JONG;CHOI, JUN YOUNG;HWANG, YOUNG JOO
分类号 H01L21/205;H01L21/3065 主分类号 H01L21/205
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