PHOTOSENSITIVE RESIN COMPOSITION, ARTICLE, AND PATTERN FORMING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a photosensitive resin composition which is easy to synthesize and inexpensively available, for achieving a dissolution contrast irrespective of the chemical structure of the finally-obtained polyimide and for achieving a pattern with a good shape.

SOLUTION: The photosensitive resin composition includes a polyimide precursor having a repeating unit expressed by formula (1) having a hemiacetal structure in a side chain and a compound that generates a carboxylic acid by an action of light.

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