| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for inspecting an exposure device, inspecting optical characteristics with high accuracy. <P>SOLUTION: A mask pattern includes: a first pattern 11 of an LS pattern extending in a first direction Y; a second pattern 12 formed as a large LS pattern having a cycle larger than that of the first pattern and extended in the first direction Y; a third pattern 13 of the LS pattern extended in a second direction X; and a fourth pattern 14 formed as the LS pattern having a cycle larger than that of the third pattern and extended in the second direction X. An irradiating light is made obliquely incident to the first pattern and the second pattern from a first oblique direction, an irradiating light is made obliquely incident to the third pattern and the fourth pattern from a second oblique direction, a relative distance between the first pattern and the second pattern, and a relative distance between the third pattern and the fourth pattern, respectively transcribed to the received image body, are measured to obtain the optical characteristic of the exposure device on the basis of the relative distances. <P>COPYRIGHT: (C)2010,JPO&INPIT |
