| 摘要 |
PROBLEM TO BE SOLVED: To provide a cleaning device and a cleaning method capable of reducing the amount of chemical solution attached to a lifter which will be brought into to a rinsing tank, in a rinsing process after a chemical solution process, thereby preventing etching in the rinsing tank. SOLUTION: A lifter 2 is cleaned after cleaning of a semiconductor substrate. Integration calculation is carried out until a difference value between a resistivity value of solution, which includes a chemical solution used at a chemical solution process and pure water, and an initial resistivity value before cleaning the lifter, becomes a predetermined value that is preliminarily set. An amount of residual chemical solution attached to the lifter is calculated, and a cleaning time to getting a cleaned state of the lifter is calculated from the calculated amount of residual chemical solution. By cleaning the lifter by pure water until the cleaning time elapses, etching in a rinsing process tank can be prevented, and quality, reliability, and yield of a fine device can be maintained. COPYRIGHT: (C)2010,JPO&INPIT
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