发明名称 PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE FABRICATION METHOD
摘要 The present invention provides a projection optical system for projecting a pattern of an object plane onto an image plane, including a first lens whose refractive index irreversibly increases by ultraviolet irradiation, and a second lens whose refractive index irreversibly decreases by the ultraviolet irradiation.
申请公布号 US2010091361(A1) 申请公布日期 2010.04.15
申请号 US20090577635 申请日期 2009.10.12
申请人 CANON KABUSHIKI KAISHA 发明人 YUUKI HIROYUKI
分类号 G02B13/14;G03B27/54 主分类号 G02B13/14
代理机构 代理人
主权项
地址