发明名称 |
METHODS OF UTILIZING BLOCK COPOLYMER TO FORM PATTERNS |
摘要 |
Some embodiments include methods of forming patterns in which a block copolymer-containing composition is formed over a substrate, and is then patterned to form a first mask. The block copolymer of the composition is subsequently induced into forming a repeating pattern within the first mask. Portions of the repeating pattern are then removed to form a second mask from the first mask. The patterning of the block copolymer-containing composition may utilize photolithography. Alternatively, the substrate may have regions which wet differently relative to one another with respect to the block copolymer-containing composition, and the patterning of the first mask may utilize such differences in wetting in forming the first mask. |
申请公布号 |
WO2010042290(A2) |
申请公布日期 |
2010.04.15 |
申请号 |
WO2009US56504 |
申请日期 |
2009.09.10 |
申请人 |
MICRON TECHNOLOGY, INC.;SILLS, SCOTT;MILLWARD, DAN |
发明人 |
SILLS, SCOTT;MILLWARD, DAN |
分类号 |
H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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