发明名称 ASSEMBLY FOR CONTROLLING PRESSURE AND PLASMA PROCESSING APPARATUS THEREWITH
摘要 PURPOSE: A pressure control assembly and a plasma processing device including the same are provided to improve density of plasma by including a driving unit which lifts a pressure control ring. CONSTITUTION: A pressure control assembly comprises a pressure control ring and a driving unit(350). The pressure control ring surrounds the plasma process region inside a chamber(100). The center of the pressure control ring is vertically penetrated and the vertically extended height is larger than the width. The driving unit lifts the pressure control ring.
申请公布号 KR20100039063(A) 申请公布日期 2010.04.15
申请号 KR20080098273 申请日期 2008.10.07
申请人 MAXIS CO., LTD. 发明人 CHUNG, SANG GON;LEE, KYUNG HO
分类号 H01L21/3065 主分类号 H01L21/3065
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