发明名称 |
ASSEMBLY FOR CONTROLLING PRESSURE AND PLASMA PROCESSING APPARATUS THEREWITH |
摘要 |
PURPOSE: A pressure control assembly and a plasma processing device including the same are provided to improve density of plasma by including a driving unit which lifts a pressure control ring. CONSTITUTION: A pressure control assembly comprises a pressure control ring and a driving unit(350). The pressure control ring surrounds the plasma process region inside a chamber(100). The center of the pressure control ring is vertically penetrated and the vertically extended height is larger than the width. The driving unit lifts the pressure control ring.
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申请公布号 |
KR20100039063(A) |
申请公布日期 |
2010.04.15 |
申请号 |
KR20080098273 |
申请日期 |
2008.10.07 |
申请人 |
MAXIS CO., LTD. |
发明人 |
CHUNG, SANG GON;LEE, KYUNG HO |
分类号 |
H01L21/3065 |
主分类号 |
H01L21/3065 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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