HOLDING DEVICE, SUBSTRATE TREATMENT APPARATUS AND METHOD FOR PRODUCING DISPLAY DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a technique capable of highly precisely alligning a substrate and a mask by cooling a holding device heated in a film deposition stage, thereby reducing the influence of heat deformation caused by heat accumulation. SOLUTION: The holding device comprising holding a substrate, a pattern-formed part where a mask pattern arranged on the substrate is formed and a mask having a mask frame supporting the circumference of the pattern-formed part comprises: a base holding the substrate and the mask frame at the holding face; permanent electromagnets arranged along the holding face and fixing the substrate and mask to the base by attracting the mask by magnetic attraction; and a cooling mechanism bringing the cooling body cooled by a cooling medium into contact with the base so as to cool the base. COPYRIGHT: (C)2010,JPO&INPIT