发明名称 |
ENERGY SOURCES FOR CURING IN AN IMPRINT LITHOGRAPHY SYSTEM |
摘要 |
Energy sources and methods for curing in an imprint lithography system are described. The energy sources may include one or more energy elements positioned outside of the viewing range of an imaging unit monitoring elements of the imprint lithography system. Each energy source is configured to provide energy along a path to solidify polymerizable material on a substrate. |
申请公布号 |
WO2010042141(A2) |
申请公布日期 |
2010.04.15 |
申请号 |
WO2009US04454 |
申请日期 |
2009.08.04 |
申请人 |
MOLECULAR IMPRINTS, INC. |
发明人 |
GANAPATHISUBRAMANIAN, MAHADEVAN;CHOI, BYUNG-JIN;WANG, LIANG;RUIZ, ALEX |
分类号 |
G03F7/00;G03F9/00 |
主分类号 |
G03F7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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