METHOD AND APPARATUS FOR DECIDING TEMPERATURE OF SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To provide a method for deciding a temperature of a substrate under treatment with high precision with no optical and/or mechanical contact with the substrate. SOLUTION: The method for deciding the temperature of the substrate is disclosed, including the steps of: providing a gas flow path surrounded by at least one wall having a particular wall temperature; providing the gas flow path adjacent to at least one wall with a substrate so that a gap may be created between the surface of the substrate and at least one wall; providing a gas flow extending at least partially through the gap with a particular mass flow via the gas flow path; determining a decrease in pressure of the gas flow along the gas flow path; and obtaining the temperature of the substrate from the decrease in pressure utilizing a predetermined relation between the decrease in pressure along the gas flow path and the temperature of the wall and the substrate. An apparatus is also disclosed that performs the method to be disclosed. COPYRIGHT: (C)2010,JPO&INPIT