发明名称 INSPECTION IMAGE USED FOR ELECTRON BEAM INSPECTION, ELECTRON BEAM INSPECTION METHOD, AND ELECTRON BEAM INSPECTION DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide an inspection image, inspection method and inspection device using electron beams, with an expanded beam scan dimension (a field of vision; FOV) and with uniform or near-uniform CD distribution in the field to stabilize measurement in the FOV, in order to make an easy process control including variations in local CD, CD difference of vertical and horizontal line and the like. Ž<P>SOLUTION: The inspection image of the electron beam inspection is arranged such that each of the subdivided images of subdivided subfields of a plurality of images at an optimal focus position are connected into one piece of image. The method includes: a first step of acquiring a plurality of images by changing an objective lens focus or by changing vertical positions of sample stages at a predetermined spacing; a second step of calculating the CD distribution in the FOV through comparison of the acquired images with the designed data; and a third step of getting the final inspection image by dividing the FOV into subfields and connecting the subdivided images of each subfield at the optimal focus position in order to get the uniform CD distribution. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2010086759(A) 申请公布日期 2010.04.15
申请号 JP20080253804 申请日期 2008.09.30
申请人 TOPCON CORP 发明人 HIGUCHI AKIRA
分类号 H01J37/22;H01J37/21;H01J37/28;H01L21/66 主分类号 H01J37/22
代理机构 代理人
主权项
地址