| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a technique which can suppress the position shift of a processing object (substrate) in the case the processing object is held using a permanent magnet. Ž<P>SOLUTION: The holding mechanism for holding a processing object and a mask including a mask pattern located on the processing object and a mask frame, which supports the mask pattern in a periphery thereof, includes: a base configured to hold, on a holding surface thereof, the processing object and the mask frame; a permanent magnet, arranged along the holding surface of the base, configured to fix the processing object and the mask on the base by magnetically attracting the mask; and a pressing unit which is located on a peripheral portion of the mask pattern, includes a to-be-attracted portion magnetically attracted by the permanent magnet, and is configured to press the peripheral portion of the mask pattern toward the base as the permanent magnet magnetically attracts the to-be-attracted portion. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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