发明名称 EXPOSURE METHOD AND EXPOSURE MASK
摘要 <P>PROBLEM TO BE SOLVED: To solve the problem that an exposure object cannot be exposed to form a perpendicular end face of an exposure region because of diffracted light. <P>SOLUTION: Diffracted light inclined at &theta; having enough amount of light to expose a liquid crystal material 15 is converted by a condenser lens 80 into light in a perpendicular direction same as the exposure light incident on an aperture 8a. The diffracted light inclined at less than &theta; traveling toward the liquid crystal material 15 is directed toward the center of the condenser lens 80. The liquid crystal material 15 is irradiated with the diffracted light, the direction of which is converted into a perpendicular direction as shown in the figure, so that the end face of an exposure region is made perpendicular without skewing. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010085957(A) 申请公布日期 2010.04.15
申请号 JP20080258123 申请日期 2008.10.03
申请人 SEIKO EPSON CORP 发明人 OTAKE TOSHIHIRO
分类号 G03F7/20;G03F1/38;G03F1/50;H01L21/027 主分类号 G03F7/20
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