| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide photomask blanks which, even when a light blocking material is contained in large quantity, cure with high sensitivity upon exposure and are excellent in storage stability, and a photomask which is produced using the photomask blanks, enables image formation with high resolution, and ensures high linearity of an image edge part. <P>SOLUTION: The photomask blanks have on a substrate a photosensitive composition layer containing at least one sensitizing dye selected from (A-1) dialkylaminobenzene compounds or (A-2) compounds represented by general formulae (V), (VI) and (VII), (B) a polymerization initiator, (C) a compound having an ethylenically unsaturated bond, (D) a binder polymer, and (E) a light blocking material. <P>COPYRIGHT: (C)2010,JPO&INPIT |
