| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus efficiently operated by preventing change of an image formation position and degradation of resolution, eliminating a recovery time from damage of a spectrum purification filter, and reducing a maintenance time. <P>SOLUTION: This exposure apparatus includes an EUV light source emitting EUV light, and an illumination optical system illuminating an original plate with the EUV light emitted from the EUV light source. The exposure apparatus further includes: an optical filter formed of a thin film transmitting the EUV light and blocking light other than the EUV light, and arranged in an optical path of the EUV light; and a deterioration detection means to detect deterioration of the optical filter. <P>COPYRIGHT: (C)2010,JPO&INPIT |
