发明名称 MECHANISM FOR CONVERGING CHARGED PARTICLE FLOW, METHOD FOR USING THE MECHANISM FOR CONVERGING CHARGED PARTICLE FLOW, AND VACUUM FILM-FORMING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a mechanism for converging a charged particles flow, which can suitably and simply control the converged state of the charged particles flow that is used for evaporating a raw material. SOLUTION: The mechanism for converging the charged particles flow includes: an evaporation source 15 which accommodates the raw material 13 therein; a charged-particles-flow-discharging means 110 which discharges the charged particles flow that can heat and evaporate the raw material 13; a magnet 19 which is arranged so as to face to the evaporation source and generates a magnetic flux line for converging the charged particles flow; and a magnetic member transfer means 120 which can transfer a magnetic member 31 in a space between the evaporation source 15 and the magnet 19. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010084174(A) 申请公布日期 2010.04.15
申请号 JP20080252847 申请日期 2008.09.30
申请人 SHINMAYWA INDUSTRIES LTD 发明人 KOIZUMI YASUHIRO;MARUYAMA JUNPEI
分类号 C23C14/32;H01J37/317 主分类号 C23C14/32
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