TEMPLATE HAVING ALIGNMENT MARKS FORMED OF CONTRAST MATERIAL
摘要
Imprint lithography substrates may include alignment marks formed of high contrast material. Exemplary methods for forming alignment marks having high contrast material are described.
申请公布号
WO2010042140(A2)
申请公布日期
2010.04.15
申请号
WO2009US02959
申请日期
2009.05.13
申请人
MOLECULAR IMPRINTS, INC.
发明人
SELINIDIS, KOSTA;CHOI, BYUNG-JIN;SCHMID, GERARD;THOMPSON, ECRON;MCMACKIN, IAN, M.
