| 摘要 |
<P>PROBLEM TO BE SOLVED: To form a light shielding wall while maintaining required performance of a color filter to achieve microfabrication and film thinness. <P>SOLUTION: Patterning is performed in a photo resist layer 59 formed on a color filter array 58 to remove a photo resist on boundaries from first to third colored layers 41, 54 and 57. The color filter array 58 is subjected to etching using the photo resist layer 59 as a mask by using a dry etching device to form color filter array removed parts 61 at the boundaries from the first to third colored layers 41, 54 and 57. A black light shielding layer is formed on the entire surface on the color filter array 58 so that the color filter array removed parts 61 may be filled and then the entire surface etching back is performed until the color filter array 58 is exposed to form a black matrix. <P>COPYRIGHT: (C)2010,JPO&INPIT |
