| 摘要 |
PROBLEM TO BE SOLVED: To provide an X-ray imaging device capable of dissolving disadvantages of an X-ray reflection device, with a linear slit formed. SOLUTION: The X-ray reflection device includes a plurality of curved slits, formed by dry etching a silicon wafer and an X-ray reflection plane, formed by grinding each sidewall of the plurality of slits using a magnetic fluid. A curved X-ray reflection device is formed through plastic deformation of the whole silicon wafer after forming the X-ray reflection plane. Other X-ray reflection devices are obtained, by forming a metal substrate on which a plurality of curved slits are formed with an X-ray LIGA process, and by forming grinding each side wall of the plurality of slits by using a magnetic fluid to form the X-ray reflection plane. COPYRIGHT: (C)2010,JPO&INPIT |
