| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a curable composition for nanoimprint, excellent in all of light transmittance, composition viscosity, pattern accuracy, substrate adhesiveness, light resistance, and heat resistance. Ž<P>SOLUTION: The curable composition for nanoimprint contains (A) a polymerizable monomer, (B) a photoinitiator, and (C) an ultraviolet light absorber having a molar absorption coefficient of 50,000 or more at a wavelength of 365 nm in ethyl acetate. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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