| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an inspecting device to reduce a measurement time in a defect inspection greatly. Ž<P>SOLUTION: The defect inspecting device to inspect a defect on the pattern of an object to be measured with a regular pattern arranged on a whole surface thereof, includes two imaging means to image the object to be measured, with a constant distance between the imaging means, a moving means to relatively move the imaging means and the object to be measured, a first operating means to extract the minimum means of the pattern on each of two images taken by the two imaging means and then measure the central position of the minimum means, and a second operating means to detect the presence of the pattern by calculating the variation of the difference value between two coordinates measured by the first operating means and determining the variation with a predetermined threshold. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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