发明名称 ZINC OXIDE-BASED SINTERED TARGET AND METHOD FOR PRODUCING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a zinc oxide-based sintered target which can stably form a thin film with low resistance, and to provide a method for producing the same. <P>SOLUTION: The zinc oxide-based sintered target contains 0.2 to 3 mass% aluminum, sintered density is &ge;5.5 g/cm<SP>3</SP>, and also, &ge;8 atomic% of the aluminum is present in a solid-soluted form. The target can be produced by regulating zinc oxide powder with the average grain size of &le;1 &mu;m and the composite oxide powder of zinc and aluminum with the average grain size of &le;1.5 &mu;m in such a manner that the aluminum is comprised by 0.2 to 3 mass% so as to be mixed, thereafter press-molding the mixture, and then performing sintering at 1,200 to 1,500&deg;C in a nitrogen gas flow with an oxygen concentration of &le;1 ppm so as to obtain a sintered compact in which sintered density is &ge;5.5 g/cm<SP>3</SP>, and &ge;8 atomic% of the aluminum is present in a solid-soluted form. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010084177(A) 申请公布日期 2010.04.15
申请号 JP20080253303 申请日期 2008.09.30
申请人 HITACHI METALS LTD 发明人 KUBOI TAKESHI;ISHIKAWA TAKUYA
分类号 C23C14/34;C04B35/453 主分类号 C23C14/34
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