发明名称 |
SUBSTRATE MEASUREMENT METHOD AND APPARATUS |
摘要 |
A method and apparatus for measurement of a characteristic of a substrate. A target is present on the substrate and a measurement is performed during a scanning movement of the substrate. The scanning movement of the substrate is a linear movement and the measurement includes obtaining a reflected image of the target using a pulsed light source, the duration of a single light pulse being less than 100 psec. A lithographic apparatus includes such a measurement apparatus, and a device manufacturing method includes such a measurement method.
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申请公布号 |
US2010091258(A1) |
申请公布日期 |
2010.04.15 |
申请号 |
US20090574231 |
申请日期 |
2009.10.06 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
CORBEIJ WILHELMUS MARIA;DEN BOEF ARIE JEFFREY;MOS EVERHARDUS CORNELIS |
分类号 |
G03B27/52;G01B11/24;G03B27/32 |
主分类号 |
G03B27/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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