POROUS SILICA PRECURSOR COMPOSITION AND METHOD FOR PREPARING THE SAME, POROUS SILICA FILM AND METHOD FOR FORMING THE SAME, SEMICONDUCTOR DEVICE, IMAGE DISPLAY DEVICE, AND LIQUID CRYSTAL DISPLAY DEVICE

摘要

Disclosed is a porous silica precursor composition containing an organic silane represented by the following chemical formula 1: R(R-O)Si (wherein Rand Rmay be the same or different and each represents an alkyl group, and m represents an integer of 0-3), water, an alcohol and a quaternary ammonium compound represented by the following chemical formula 2: RN(R)X (wherein Rand Rmay be the same or different and each represents an alkyl group, and X represents a halogen atom). This porous silica precursor composition is prepared by mixing such components. A porous silica film is formed by coating and firing the porous silica precursor composition. Also disclosed are a semiconductor device having a porous silica film, an image display device, and a liquid crystal display device.