| 摘要 |
PROBLEM TO BE SOLVED: To provide a positive type heat resistance photosensitive polymer composition having high sensitivity and ensuring a good pattern shape and a good rate of a residual film in the unexposed part, a method for producing a pattern by which a high resolution pattern having a good shape is obtained by using the composition and electronic parts having high reliability. SOLUTION: The photosensitive polymer composition contains (a) a polyimide precursor or a polyimide soluble in an aqueous alkali solution, (b) a compound which generates an acid under light and (c) a compound having alkoxymethyl and phenolic hydroxyl groups in one molecule. |
