| 摘要 |
A development apparatus is provided and includes a developer support, a developer-controlling member, and a developer-residue controlling member. The developer support supports developer on the surface. The developer-controlling member controls the thickness of the developer on the developer support. The developer-residue controlling member is disposed facing the developer support immediately upstream of the developer-controlling member in the direction in which the developer is conveyed by the developer support. The development apparatus also has a space between the developer-residue controlling member and the developer support that decreases in size downstream in the direction in which the developer is conveyed. |
