发明名称 Low-density cleaning substrate
摘要 The present invention is directed to a low-density substrate, which has an optimized pore volume distribution. The optimized pore volume distribution allows the substrate to hold at least 50 percent of its cumulative volume within pores with a radius size of about 110 to 250 microns. The optimized pore volume distribution can also be characterized by having a dry fibrous web that absorbs less than 20 percent of the cumulative volume of the fibrous web at a pore radius of 75 microns. The optimized pore volume distribution of the substrate enables it to controllably release a fluid composition effectively onto a surface. The basis weight of the substrate is about 80 to 20 gsm and the density of the substrate is below 0.1 g/cc. The substrate may be a pre-loaded wipe, which is either moistened by a consumer prior to use or moistened prior to packaging. The composition loaded onto the substrate may contain dry and/or liquid compositions preferably for cleaning hard or soft surfaces.
申请公布号 US7696109(B2) 申请公布日期 2010.04.13
申请号 US20060361105 申请日期 2006.02.24
申请人 THE CLOROX COMPANY 发明人 OUELLETTE WILLIAM;DANI NIKHIL;SUK RICHARD
分类号 B23B27/12;D04H1/56 主分类号 B23B27/12
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