发明名称 Semiconductor device and method for manufacturing same
摘要 A semiconductor device comprises a drift region of a first conduction type, a base region of a second conduction type, a source region of the first conduction type, a contact hole, a column region of the second conduction type, a plug and wiring. The drift region formed on a semiconductor substrate of the first conduction type. The base region of a second is formed in a prescribed region of the surface of the drift region. The source region is formed in a prescribed region of the surface of the base region. The contact hole extends from the source region surface side to the base region. The column region is formed in the drift region below the contact hole. The plug comprises a first conductive material and fills the contact hole. The wiring comprises a second conductive material and is electrically connected to the plug.
申请公布号 US7696061(B2) 申请公布日期 2010.04.13
申请号 US20070902911 申请日期 2007.09.26
申请人 NEC ELECTRONICS CORPORATION 发明人 NINOMIYA HITOSHI
分类号 H01L21/00;H01L29/78;H01L21/336;H01L29/06;H01L29/10;H01L29/15;H01L29/45 主分类号 H01L21/00
代理机构 代理人
主权项
地址