LITHOGRAPHIC APPARATUS AND HUMIDITY MEASUREMENT SYSTEM

摘要

PURPOSE: A lithographic apparatus and a humidity measurement system are provided to transfer a pattern from a patterning device to a substrate by imprinting the pattern on the substrate. CONSTITUTION: A tunable laser diode(11) emits a measurement radiation ray beam(5) with a wavelength within a wavelength range. The wavelength range includes a first wavelength which is associated to the absorption peak of water molecules. A radiation ray detector(12) measures the intensity of the measurement radiation ray beam of the tunable laser diode. A signal processing unit(14) is connected to the tunable laser diode. The signal processing unit calculates humidity.