发明名称 |
ELECTROSTATIC CHUCK HAVING BI-POLAR ELECTRODE PATTERN |
摘要 |
PURPOSE: An electrostatic chuck including a bipolar electrode pattern is provided to maintain the absorbent force regardless of the defect of the electrode by dividing electrodes and forming divisional electrode patterns. CONSTITUTION: A positive electrode(31) and a negative electrode(37) are formed on the whole surface of an electrostatic chuck. The electrodes form interdigitated patterns. An additional negative electrode(33) is formed around the positive electrode. An additional positive electrode(35) is formed around the negative electrode. When a voltage is applied on the electrostatic chuck, electrostatic force is generated from the electrostatic chuck in order to perform an absorbent process for a wafer or a substrate.
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申请公布号 |
KR20100038086(A) |
申请公布日期 |
2010.04.12 |
申请号 |
KR20100022191 |
申请日期 |
2010.03.12 |
申请人 |
ADP ENGINEERING CO., LTD. |
发明人 |
CHOI, BONG HWAN |
分类号 |
H01L21/687;B23Q3/15;H02N13/00 |
主分类号 |
H01L21/687 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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