| 摘要 |
FIELD: electric engineering. ^ SUBSTANCE: in method of washing and drying of substrates, substrates are stepwise submerged into bath of washing with deionised water, and substrate is scanned with megasound radiation established in bath, along whole width of substrate, and substrate is washed. Afterwards substrate is slowly lifted to drying chamber. In process of substrate withdrawal from deionised water, vapors of organic solvent are fed to its both sides directly to the area of substrate withdrawl with the help of two pipes having a row of holes. Device is proposed for realisation of stated method. ^ EFFECT: improved quality of washing and drying of substrates, increased efficiency, expansion of technological resources. ^ 4 cl, 6 dwg |
