发明名称 UNIT FOR SUPPLYING SOURCE AND METHOD FOR SUPPLYING SOURCE AND APPARATUS FOR DEPOSITIONING THIN FILM
摘要 PURPOSE: A unit and a method for supplying raw materials and a device for depositing a thin film are provided to prevent a substrate from sagging by not restricting a deposition direction to a specific direction. CONSTITUTION: A high frequency coil unit(513) is formed on the outside of a crucible, vaporizes raw materials, and includes a coil shaped conductive tube and a cooling medium. An injector is connected to the crucible and injects the vaporized raw materials. A resistance heating unit(514) is formed outside the injector and vaporizes the raw materials. A cooling unit is formed outside the resistance heating unit and surrounds the injector.
申请公布号 KR100952313(B1) 申请公布日期 2010.04.09
申请号 KR20090025893 申请日期 2009.03.26
申请人 SNU PRECISION CO., LTD. 发明人 BAE, KYUNG BIN;RHO, JUN SEO;CHO, WHANG SIN;KWON, JIN HAON;LEE, JONG HA;KIM, YOU HYUN;YOON, HYUNG SEOK
分类号 H01L21/203 主分类号 H01L21/203
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