| 发明名称 |
APPARATUS FOR SUPPLYING SOURCE GAS |
| 摘要 |
PURPOSE: A source gas supplying device is provided to control deposition pressure by controlling the pressure of the source gas inputted to a deposition chamber. CONSTITUTION: A source gas generating unit(210) generates a source gas by heating a source material. A source gas condensing unit(240) condenses the source gas. A carrying gas supplying unit(220) supplies the carrying gas to input the source gas to the source gas condensing unit. A sensor(250) senses the flow rate of the carrying gas.
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| 申请公布号 |
KR20100037236(A) |
申请公布日期 |
2010.04.09 |
| 申请号 |
KR20080096453 |
申请日期 |
2008.10.01 |
| 申请人 |
TERASEMICON CORPORATION |
发明人 |
JANG, SEOK PIL;SONG, JONG HO |
| 分类号 |
H01L21/02;H01L21/00 |
主分类号 |
H01L21/02 |
| 代理机构 |
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代理人 |
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| 主权项 |
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