发明名称 |
APPARATUS AND METHOD FOR ELECTRON BEAM LITHOGRAPHY |
摘要 |
<P>PROBLEM TO BE SOLVED: To improve precision of circumferential lithography by including a plurality of direct digital synthesizers using a reference clock synchronizing with the rotation of a maser in address information lithography of a magnetic disk apparatus by an electron beam mastering apparatus. Ž<P>SOLUTION: A direct digital synthesizer operating with a fixed frequency as a reference generates a spindle clock. A phase-locked loop circuit following the encoder signal of a spindle motor rotating on the basis of the spindle clock generates a rotation synchronization reference clock synchronizing with the irregular rotation of the spindle motor. A direct digital synthesizer with the rotation synchronization clock as the reference generates a write clock for the reference of a lithography pattern. Moreover, a counter counting the rotation synchronization clock or a divided signals of the same simultaneously switches the write clock and spindle clock to the next frequency every fixed count. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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申请公布号 |
JP2010079951(A) |
申请公布日期 |
2010.04.08 |
申请号 |
JP20080244105 |
申请日期 |
2008.09.24 |
申请人 |
FUJITSU LTD |
发明人 |
OZAWA YASUYUKI;IZUMI HARUHIKO |
分类号 |
G11B7/26;G03F7/20;G11B5/84;G11B5/855;G11B5/86;H01J37/305;H01L21/027 |
主分类号 |
G11B7/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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