发明名称 MEASUREMENT METHOD AND SYSTEM DURING MANUFACTURING SEMICONDUCTOR SINGLE CRYSTAL BY FZ METHOD, AND CONTROL METHOD AND SYSTEM DURING MANUFACTURING SEMICONDUCTOR SINGLE CRYSTAL BY FZ METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a measurement method and measurement system for measuring crystallization interface of a semiconductor single crystal in an initial stage of a cone part forming process for enlarging the crystal diameter from a seed necking process of an FZ (Floating Zone) method, and to provide a control method and a control system. Ž<P>SOLUTION: In an initial stage of a cone part 24 forming process for enlarging the crystal diameter from a seed necking process of an FZ method for manufacturing a semiconductor single crystal, the diameter of the crystallization interface 22 of the semiconductor single crystal crystallized at the inside of a heating coil is measured through arithmetic processing of triangulation using the parallax between a first camera 12 arranged at a position having a height different from that of the crystallization interface 22 and a second camera 14 arranged at a position having the same height as that of the first camera 12 and having an optical axis parallel to the first camera 12, with respect to the crystallization interface 22. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2010076979(A) 申请公布日期 2010.04.08
申请号 JP20080248135 申请日期 2008.09.26
申请人 SUMCO TECHXIV CORP 发明人 SATO TOSHIYUKI
分类号 C30B13/30 主分类号 C30B13/30
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