发明名称 LITHOGRAPHIC APPARATUS AND HUMIDITY MEASUREMENT SYSTEM
摘要 A humidity measurement system for use in, for example, a lithographic apparatus. The humidity measurement system includes a tunable laser diode configured to emit a measurement radiation beam having a wavelength in a wavelength range. The wavelength range includes a first wavelength associated with an absorption peak of water molecules. A signal processing unit is connected to a radiation detector. The signal processing unit is configured to measure an intensity of the measurement radiation beam of the tunable laser diode subjected to absorption. The signal processing unit is also connected to the tunable laser diode for obtaining wavelength information. The signal processing unit is arranged to detect an extreme value in a measured intensity as function of the wavelength and to calculate a humidity value from the detected extreme value.
申请公布号 US2010085546(A1) 申请公布日期 2010.04.08
申请号 US20090572433 申请日期 2009.10.02
申请人 ASML NETHERLANDS B.V. 发明人 VAN DOOREN LEON;JACOBS JOHANNES HENRICUS WILHELMUS;JONKER WOUTER ANDRIES
分类号 G03B27/52;G01N21/00 主分类号 G03B27/52
代理机构 代理人
主权项
地址