DISLOCATION ENGINEERING USING A SCANNED LASER

摘要

A method for generating patterned strained regions in a semiconductor device is provided. The method includes directing a light-emitting beam locally onto a surface portion of a semiconductor body; and manipulating a plurality of dislocations located proximate to the surface portion of the semiconductor body utilizing the light-emitting beam, the light- emitting beam being characterized as having a scan speed, so as to produce the patterned strained regions.