| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To enable highly accurate processing without controlling a focal position during processing even if a substrate has deflection, when laser beam processing is performed from above by placing on the lower side a thin film formed on the large substrate. <P>SOLUTION: Disclosed is a beam processing apparatus that processes a layer to be processed 3 formed on one surface of a glass substrate 2, while irradiating the same with a beam. An objective optical apparatus 51 of a beam irradiating means 50 includes a conical lens as an axially-condensing optical element 52 in order to emit Bessel beams. A Bessel beam is an axially-condensed beam and the diameter of the beam, in particular the diameter of the region in the center where the intensity peaks, does not change greatly in the range where the distance from the conical lens is short. Therefore, even if the position of irradiating the objective optical apparatus 51 with the beam changes due to deflection of the substrate, the position would still be within the range of the focus depth of the Bessel beam, thus enabling highly accurate processing without having to implement control such as changing the focal position during processing. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
