发明名称 |
METHOD FOR MANUFACTURING MAGNETORESISTIVE ELEMENT |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a manufacturing method improving an MR ratio of a magnetoresistive element by preparing a tunnel barrier layer having an optimum composition ratio in stoichiometry and high crystallinity. Ž<P>SOLUTION: The manufacturing method includes: a step of forming a pinned magnetic layer (CoFeB); a step of forming a non-magnetic intermediate layer (MgO); and a step of forming a magnetic free layer (CoFeB). The step of forming the non-magnetic intermediate layer (MgO) includes a step of forming a stoichiometric magnesium oxide film by performing high-frequency sputtering a magnesium oxide target under process gas pressure of 0.0400 to 26.66 Pa. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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申请公布号 |
JP2010080812(A) |
申请公布日期 |
2010.04.08 |
申请号 |
JP20080249584 |
申请日期 |
2008.09.29 |
申请人 |
CANON ANELVA CORP |
发明人 |
CHOI YOUNG-SUK;NAGAMINE YOSHINORI;NAGAI MOTOMASA;TSUNEKAWA KOJI;DAVID JAYAPURAWIRA |
分类号 |
H01L43/12;H01L21/316;H01L43/08;H01L43/10 |
主分类号 |
H01L43/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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