RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND ACID GENERATOR INCLUDING THE COMPOUND

摘要

PURPOSE: A resist composition is provided to suppress the degeneration of a resist film and the change of a refractive index of a dipping solvent and to form a resist pattern with excellent shape. CONSTITUTION: A resist composition comprises: a base component(A) which exhibits changed solubility in an alkali developing solution under action of acid; and an acid-generator component(B) which generates acid upon exposure, wherein said acid-generator component(B) includes an acid generator(B1) composed of a compound having a base dissociable group within a cation moiety.